Implant Process Engineer
CurrentIt turns out the pastures were not much greener just more secure. I began life at Intel in F12 Implant working on an 8" 0.18 micron technology as I started a Ph.D. in Materials Science at ASU part time. We converted the factory to 12" in 2004 while I was in Portland learning the 65nm technology for 18 months and working on my Dissertation. I graduated from ASU in December 2006. I returned from Portland to sustain the AMAT QuantumX toolset until October 2010 when I had a chance to move next door to F32. Until June 2012 I worked on sustaining the 32nm process on the Varian Vista HCi toolset. Then I began helping with the 22nm process on the same toolset. In July 2013 I got to go back to Portland for 6 months to learn and then transfer the 14nm Implant process back to F32. In 2019 I helped transition the factory to the 10nm process. In 2021 I began leading an integrated engineering team tasked with defect reduction across the Metal Gate section of the line. Then in the summer of 2024 I went back to Oregon to work on transferring the 18A Implant process to Arizona. My passions surround using the vast capabilities of Ion Implantation to enhance device performance and Yield by modifying material characteristics. The success I have had improving our process flow has been exciting. I have also had multiple opportunities to explore the corners of our processing space to resolve Implant problems in various taskforces. The key to both of these facets of my work has been using model based problem solving and applying a first principles approach to the interaction of ion beams with device structures.