Served as the simulation software architect, where I created and principally developed a photolithography simulation system used throughout a $100M+ product line. Performed extensive performance optimizations to reduce memory usage, increase compute intensity, and reduce turn-around-time. Developed highly efficient back-ends targeting CPUs and GPUs, which included a custom JIT compiler that generates optimized model-specific machine code for high-throughput scientific computations.

Developed software for lithography tools and applications, including lead development of a lithography hotspot checker.Lived as a expatriate in Shanghai, China for six months to customize and install Calibre software for a new customer. This work won me a Mentor Graphics Global Trade Award.Performed customer support for Calibre optical proximity correction (OPC) and design rule checking (DRC) products.

Developed accurate lithography models for the 180 nm and 130 nm technology nodes. Wrote optical proximity correction (OPC) scripts and automation software.