Ashish Rathore Email and Phone Number

1) Lithography process improvements and support for EU semiconductor customers.2) Development of sustainable (PFAS-free) photoresist grades.3) Defectivity measurement and analysis of current photoresist grades.

Photoresist design and process optimization for EUV Lithography.

Topic: New material chemistry exploration for Extreme Ultraviolet (EUV) Lithography.The major problem associated with the current systems of EUV resist is something known as Reolution-Line edge roughness-Sensitivity (RLS) tradeoff, which is caused due to the chemical variability at nanoscale. Only through the fundamental understanding of the chemistry of the process, it will be possible to produce robust resist systems that can work efficiently for EUV lithography. The objective of this… Show more Topic: New material chemistry exploration for Extreme Ultraviolet (EUV) Lithography.The major problem associated with the current systems of EUV resist is something known as Reolution-Line edge roughness-Sensitivity (RLS) tradeoff, which is caused due to the chemical variability at nanoscale. Only through the fundamental understanding of the chemistry of the process, it will be possible to produce robust resist systems that can work efficiently for EUV lithography. The objective of this research project is to bridge this understanding.The approach of this project is a combination of two ways: 1) To enhance our knowledge of fundamental chemistry happening at the nanoscale level during EUV-patterning (through experiments such as solid and gas-phase reactions)2) To use that understanding to design and characterize novel and robust EUV-resist systems (through understanding synthesis of novel EUV systems, EUV patterning using EUV scanner, CD-SEM analysis and RLS characterization).Expected results from the project is to get a better understanding of the fundamental chemistry and correlating that to the critical parameters of novel EUV resist systems. Show less

Goal: Design and engineer nanomaterials with different mechanical stiffness, surface chemistry and surface morphology for bioapplicationsTechniques-•Nanofabrication: Photolithography, Soft material replication•Surface engineering: Atomic Layer Deposition (ALD), Chemical Vapour Deposition (CVD), SAMs deposition using Silaneoven, Oxygen plasma/UVO cleaning, Guided pattern collapse using Flip-chip bonder•Characterization: SEM (cross and top-down), ATR-FTIR, Nanoprobe, Contact… Show more Goal: Design and engineer nanomaterials with different mechanical stiffness, surface chemistry and surface morphology for bioapplicationsTechniques-•Nanofabrication: Photolithography, Soft material replication•Surface engineering: Atomic Layer Deposition (ALD), Chemical Vapour Deposition (CVD), SAMs deposition using Silaneoven, Oxygen plasma/UVO cleaning, Guided pattern collapse using Flip-chip bonder•Characterization: SEM (cross and top-down), ATR-FTIR, Nanoprobe, Contact angle measurement Show less

Gas-phase experiments to understand the electron-induced mechanism in the EUV-photoresist monomers.

Film-phase experiments to understand electron-induced mechanisms in the EUV-photoresist monomers.

Synthesizing metal-oxo-clusters for EUV-resist applications.

As a research assistant, my tasks involved handling and maintenance of a pilot spray dryer apparatus.Assisted in experiments to produce homogeneous cocoa particles of different particle size distribution coated with variable concentrations of whey protein. Tested the samples for parameters like wettability and flocculation time using Suspension method and Drum agglomerator.