Business Development

Key account manager focusing on: Business development Strategic planningCustomer relationshipNegotiationCross-functional program management

Visiting scholar in EE departmentHigh-mobility channel device research

Senior Member of Technical Staff, Exploratory Research Group Member of Technical Staff at IBM T.J. Watson research centerGlobalFoundries/IBM research allianceFront-end-of-line materials research and integration for development of next generation CMOS technology at various IBM facilities including T. J. Watson center, Albany Nanotech, and National Synchrotron Light Source at Brookhaven National Lab.Lead/coordinated the overall silicide R&D strategy and activities across multiple sites in IBM research alliance (T. J. Watson research center, East Fishkill, and Albany Nanotech).Close collaboration with development teams to continuously improve the silicide module for 65/45/32/22nm CMOS technology.Researched high mobility devices for future CMOS technology node (10nm and beyond).Key contact person for university research projects funded Semiconductor Research Corporation and represented GF at reviewsAnalyzed, summarized, and transferred key learning from universities/consortia to GF.

IBM/AMD/Toshiba/NEC/ST research alliance at IBM T.J. Watson Research CenterCMOS Front-end process and materials research for 22nm and beyondResearch in Silicide and Si:C epitaxial film.

Silicide process development for 65/45nm memory devices in Advanced Process Development group

CVD (SiGe epitaxy ), surface science, thin film, nanotechnology

strain silicon, SiGe epitaxy, defect etchDeveloped a RTCVD process for high quality SiGe epitaxial films with very low defect density within three months.Investigated the relaxation of strained Si films on SiGe substrates.