Brian Davidson Email & Phone Number

• Senior Engineer within the Front End Of Line (FEOL), group• A hands-on cleanroom based role supporting substrate patterning• UV photolithography (automated proximity mask aligner) and SSEC cassette to cassette tools for: cleaning, photoresist coating, developing, etching and resist stripping• Ensure on time supply of high quality substrates, with low number of defects, for polymer OLED display panels and OLED lighting panels (for Light and Building Exhibition, Frankfurt, 2012 and TSB TOPDRAWER).• Continuous process improvement: monitoring of quality throughout patterning process (AOI); identification of defect types and sources• Metrology for defect inspection, layer thickness and overlay accuracy.• SPC and data analysis (Minitab and in-house software)• Represent FEOL on Safety Audit Committee and Chair Cleanroom User Group: ensuring a safe and clean working environment.

Southampton, United Kingdom

• Responsible for the Yellow Room/photolithography section of Polymer Vision's production facility for flexible displays for the “Readius” E-reader.• Process transfer from the R&D group of PVL based in Eindhoven.• Set up photolithography processes: coat and develop a range of resists and organic materials on SVG 90s tracks and UV exposure on Micralign 1:1 projection tool.• Write standard operating procedures (SOPs, controlled documentation)• Train operators according to SOPs • Establish metrics for SPC and monitoring Cpk• 8-D teams and design of experiments (DOEs) to improve product performance and yield and identify failure modes (FMEA).

Southampton, United Kingdom

Innos Ltd, initially at Mountbatten Building, University of Southampton, but, after a devastating fire on 30/10/2005, at the Philips MiPlaza facility in Eindhoven during 2006 and then at a new cleanroom at Millbrook Technology Campus, Southampton (equipped to support Polymer Vision).• Responsible for e-beam lithography: direct-write (Jeol JBX9300FS); pattern conversion and proximity calculation software (Caprox)• Photolithography processes: Nikon i-line stepper; EVG mask aligner• Close collaboration with researchers on a range of projects.• Dry etching (RIE, ICP and deep Si (Bosch process))• Characterisation techniques (FEGSEM, Nanospec, Alphastep)• Equipment purchasing: specification, tender procedure, comparative evaluation, pre-shipment acceptance, commissioning and operation (e-beam lithography, photolithography, FEGSEM and RIE systems).

Southampton, United Kingdom

Post-Doctoral Research Fellow within the central microelectronics fabrication facility which provided semiconductor (mainly silicon) device processing for UK University research projects. Responsibility for running this facility was transferred to Innos Ltd (see above for details)

London, United Kingdom

Post-Doctoral Research Fellow (RAII) at Centre for Electronic Materials and Devices, Imperial College of Science and Technology, London (prior to 1/04/99 Interdisciplinary Research Centre for Semiconductor Materials).Research activities within groups led by Prof R.C. Newman and Prof G. Parry: • fabrication of 2D photonic crystals using e-beam lithography and RIE• FTIR absorption LVM spectroscopy of carbon acceptors (CV) and H-CV pairs in III-V compound semiconductors (GaAs, AlAs, InP) • study of carbon δ-doping of in AlAs/GaAs DBRs for low series resistance vertical cavity surface emitting lasers (VCSELs)

London, United Kingdom

Nottingham, United Kingdom

Low temperature magneto-transport measurements on semiconductor devices.

Doctor Of Philosophy (Ph.D.), Semiconductor Physics "Magnetotransport In Short Semiconductor Structures"

Bachelor Of Science (Bsc), Physics

Education record