• Originated responsibility for Test Global Domain program alignment, systems development and business process integration across GLOBALFOUNDRIES sites.• Drove to completion an effort to indoctrinate effective and efficient Wafer Electrical Test (WET) disposition methods with Test Engineering, Product Engineering, and Quality teams.• Championed business process definition for New Product Introduction (NPI) at the Malta site to improve control definition and customer data transfers First Time Right success by 90%. • Reinvigorated Statistical Process Control (SPC) support with investment in control plan integration and proper chart definition.

• Lead and align Process and Equipment Control (PEC) Global Domain Teams to facilitate global alignment, communication and systems convergence for all GLOBALFOUNDIRES 300mm fabs.• Oversee global Statistical Process Control (SPC) program alignment, systems development and integration for both the inline and eTest domains.• Plan and execute Firm Fixed Price (FFP) systems development projects with external suppliers to provide systems enhancements in accordance with key business requirements.• Drive a global effort to align Fault Detection and Classification (FDC) domain knowledge, business processes and Best Known Methods (BKM) to indoctrinate the program across the company.• Managed a Process and Equipment Control (PEC) group within Manufacturing Technology responsible for global alignment and development of factory automation and control solutions in APC, FDC, SPC, Lithography Control and related domains.• Directly managed a team of six senior engineers, $250K capital budget and a group responsible for PEC programs across fabs in New York, Dresden and Singapore.• Sponsored the development and implementation of novel Tool Matching and fingerprinting capabilities to reduce variability and improve new tool release procedures.

• Assessed key business drivers and gaps to define annual program goals and objectives for the Process Equipment and Control domain across all three GLOBALFOUNDRIES sites.• Championed and led a team of technical leads within the Manufacturing Systems and Technology (MST) organization to develop a comprehensive, five-year technical roadmap for Automated Precision Manufacturing solutions.• Coordinated global efforts to develop a Lithography control roadmap, and led initiates to improve scanner monitoring and excursion prevention solutions.• Identified the need for technology transfer efficiency in the APC application domain and sponsored efforts to refactor the suite of application to prepare for the startup of Fab 8 in Malta.• Led and coordinated a Variability Reduction program across all GLOBALFOUNDRIES sites that identified key manufacturing variability challenges, identified the most effective control methods to address them, and shared the learning as BKM.• Defined and lead an initiative around Design for Manufacturability that sought to gain a line of sight from PDK development through to manufacturing capability development, and the improvement that could be realized in the former through innovations in the latter.• Assumed technical direction responsibilities for internal systems development in support of SPC and FDC solutions.

• Received recognition as an authority on the state of AMD's Automated Precision Manufacturing (APM) implementations and roadmap, and communicated said both internally and externally.• Completed an expatriate assignment to Singapore to provide onsite management and execution of an Advanced Process Control licensing and implementation project with Chartered Semiconductor, creating improvements valued in the tens of millions. • Project successfully transferred and implemented the first controller in less than nine months. • Maintained project execution according to its established schedule and priorities, completing on time the transfer an implementation of 14 separate control applications in the Fab 7 facility.• Facilitated joint company project meetings, including Chartered onsite meetings and AMD/Chartered teleconferences.• Provided guidance on the staffing, training and development of an APC organization in the Chartered Fab 7 to sustain the transferred APC technology upon completion of the agreement.• Established within the Chartered APC group BKM for controller testing, support, deployment and change management.• Drove technical management of the combined company resources to implement APC within the facility, thereby improving process capabilities (Cpk) by 60% to 288%. • Served as APM domain patent advocate continuously since 2005, representing the company’s interests in Intellectual Property protection and development.

• Proliferated Advanced Process Control (APC) across multiple modules, with development and ownership of several Lithography applications, as well as Diffusion and Etch processes.• Led the APC/Litho team in AMD Fab 25 to continuously develop new capabilities, extend existing capabilities to meet new control challenges, and train additional engineers to support the growing number of controllers.• Facilitated the Fab 25 conversion to Flash memory manufacturing by creating more than eight specific Overlay modeling and control advancements, which allowed a continuous production ramp with under a 0.5% overlay rework rate.• Introduced Linear Model Predictive Control capabilities to Lithography control applications to realize a 10% control performance improvement.• Directed control technology development, both in terms of novel theory and the application of existing control theory from other industries, e.g. Recursive Least Squares, Bayesian control, Plant Wide Control.• Developed and managed the implementation of a controller monitoring and optimization roadmap, which indoctrinated BKM methods and improve engineering efficiency in maintaining control performance. • Led an R&D project that pursued implementation of the industry’s first control solution that explicitly monitored and controlled processes based on electrical test parameters.• Trained and mentored individuals on control technology internally, at alliance partner companies and in additional third-party companies.• Facilitated technical management within the organization, including APC program development, monthly reporting, and cross-site collaboration between Austin and Dresden fabs.

• Invented, developed and implemented Advanced Process Control (APC) for Lithography overlay, reducing maximum measured error by 44% and reworked wafers by 80%.• Introduced novel business process and rules to Lithography operations through factory automation and control, thereby facilitating full mix-and-match Lithography, automated rework and new product initialization, and other productivity gains.• Developed and implemented integrated Lithography and Etch control application for Lithography critical dimension (CD) control, improving Cpk by 40%.• Established Advanced Process Control techniques within the semiconductor industry as a major inventor, factory automation architect and recognized technical leader within the industry.• Standardized control implementations as a principle architect of a common application development library, thereby establishing BKM and reducing development time and support requirements.• Led the initial APC technology transfer and training effort for a new Dresden fab facility.• Championed control and automation improvements that effectively eliminated the need to run pilot wafers to initialize new processes or control contexts.