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Gas Analysis sensors and advanced equipment control implementation on High Volume Industrial Plasma Physics manufacturing tools though fault detection and real time process control strategies. The deployment of solutions brings the cost of manufacturing down through reducing lost profits from operations, scrap production, and unscheduled manufacturing tool downtime by giving insight into the chemical matrix within the manufacturing tool environment and chambers. Through feed forward - feed back monitoring, traceability, and continuous process learning achieves a higher standard both locally at the MES (manufacturing execution system) or tool controler and as well in the CIM (computer integrated manufacturing infrastructure or AEC APC platform) running all the elements of a modern factory or FAB.

Manufacturer of miniature high pressure process and residual gas analysis instrumentation ( quadrupole array mass spectrometers and capicitance diaphragm guages) used in high volume industrial process manufacturing; aerospace, semiconductors, thin films, architectural and automotive glass manufacturing, solar pannel, flat pannel display, disk drive manufacturing, metalurgical coatings, etc.Gas analysis linked with advanced equipment control through fault detection and real time process control increase bottom line by steming lost profits from operations, improving OEE (overal equipment efficiency), reducing scrap and unscheduled downtime. As many manufacturing tools come ill equipped to provide such real time measurements, there are huge gains to be reaped by the premier Semiconduictor manufacturers, where average losses from unresolved engineering challenges are astronomical, and in many cases unknown losses. The difficult path is to take well honed processes, and even normal maintenance proceedures, and subject them to the light of hard data. As the industry boom bust and ramping of new products leaves only narrow windows where such strategies can be developed, tested, supported, early adopters take on the lion share of the risks in an ever increasingly competitave market. With the shift from vertical fabrication facilities with R&D to the more modern wafer mines or foundry model, the need for sensor based fault detection is now paramount. By providing the means to accelerate tools from non productive to productive states (scheduled and unscheduled maintenance), and to ultimately give insight into process anomalies, first wafer effects, by implementation of applications considered low hanging fruit (downtime), the onboard sensor can then be used as real time process shifts occur. Consistant with the lack of feed forward feed back process incoming and outgoing wafer states are frequently unknown, keeping random process shifts from real time analysis.