Derek Summers Email & Phone Number

Albany, NY, US

Malta, NY, US

Lead, develop and implement improved ASML scanner equipment monitoring controls for dose, focus and overlay performance. Analyze production runtime data to identify opportunities for improvement, including automation and reduced sampling to minimize engineering time and optimize production cycle time. Serve as defect expert for reticle engineers.Created a.

Malta, NY, US

Served as strategist and lead process development engineer. Worked with customers to develop and qualify novel 14nm technology for volume manufacturing, including tool and process technology characterization, troubleshooting and qualification, system and recipe setup and manufacturing. Met with customers daily to review progress and stay on schedule to.

Malta, NY, US

Served as company representative for EUV equipment factory acceptance. Served as engineer responsible for setup of EUV equipment control automation, recipe integration with factory systems, equipment qualifications and equipment controls.Served as company representative in Veldhoven, Netherlands for factory acceptance of EUV lithography equipment. Drove.

Malta, NY, US

Led a team of lithography unit process engineers responsible for setup, control and optimization of contact/via module lithography processes while managing projects for lean manufacturing opportunities. Managed contact, metal and via process modules for 14nm, 20nm, 28nm, 32nm nodes including lithography equipment and process qualification. Collaborated.

Malta, NY, US

Served as founding member of photolithography team tasked with start-up of semiconductor Fab 8 facility and first silicon. Transferred and qualified 28nm process technology from Fab 1 Dresden, Germany as well as 32nm process technology from IBM Fishkill. Held residency in Germany to document process specifications and constraints for technology transfer to.

Owned and managed front end-of-line photolithography unit process layers. Served as photolithography statistical process control champion to manage and report Process Capability Index (Cpk) performance of internal and key customer specifications. Led team of technicians and operators to oversee reticle inspection and inventory management for ATMC..

Served as member of the Research Team responsible for 65nm and 90nm technology research and development. Evaluated Attenuated Phase Shift Mask (APSM), Complementary Phase Shift Mask (CPSM) and Chromeless Phase Lithography (CPL) reticle technologies based on process window, resolution, uniformity and through pitch.Supported process development of contact.

Brookfield, CT, US

Served as member of the Process Development Team with responsibility for 90nm technology. Improved 90nm development photolithography metrology cycle time by 50% by correlating Scanning Electron Microscope (SEM) to optical-based metrology. Optimized SEM recipe design and setup for resolution, linearity, and registration through pitch data collection..

Brookfield, CT, US

Served as member of Materials Research Team tasked with materials research and development of novel reticle thin film technology to enable advanced process nodes. Completed factory acceptance and site qualification of a Veeco LDD Ion Beam Deposition Tool. Reduced defect levels and optimized film thickness and optical properties of antireflective chrome and.