Earl Ebert Email & Phone Number

Oxford, Connecticut, United States

Opportunistic Consulting, Otherwise Retired

Wilton, Ct

Systems Engineering and analysis of a set of modules on state-of-the-art microlithography tools. Modules include an optical alignment sensor, an air gauge focus calibration sensor, a maskless lithography system and a precision moving stage. Alignment sensor development required all facets of classical systems engineering: Architecture, Requirements, Analysis and Test. Requirements are traceable from top level system requirements to test requirements. Analytical verification of this interferometric sensor's performance provided using a physical optics model of the sensor developed in the analysis program ASAP. Said model includes a Monte Carlo loop to flesh out the performance envelope. This model has been used to predict many unexpected performance characteristics.

Middletown, Ct

Consulting business. Efforts included requirements development, design support and integration support for optics thermal correction system, detailed optics design for new displacement measuring interferometers, production line support of problematic displacement measuring interferometers, algorithm and code development of a coordinate transformation for a 6 degree of freedom interferometer-controlled stage, error correction for said transformation, optical design for a visible camera used in conjunction with a UV scanning lens, optical design of a UV scanning lens, requirements development for a precision stage system, process flow development and identification of throughput bottlenecks for a lithography tool, test planning for an optics test facility. Development of detailed project plan (MS Project) for a measurement device.

Middlefield, Ct

Systems Engineering responsibility for Large Aperture Interferometer and Motion Measurement product lines. Initial Large Aperture duties included bringing 24" wavelength modulated interferometer and industrial surface interferometer (Mesa) through test and into production. Transition to duties as lead Systems Engineer for the ZMI displacement measuring interferometer line. ZMI duties involved development of customer requirements for a next generation interferometer product. Customer requirements development required heavy interaction with strategic customers. Program management responsibility for a low cost displacement measuring interferometer (ZMI 510). ZMI-510 completed on time and to specification.

Ridgefield, Ct

SVGL was a Lithography Tool Manufacturer (purchased by ASML)Manager of Advanced Program's systems engineering effort. Interviewed, processed, hired and led a seven member systems engineering team that was matrixed into Advanced Program's project oriented organization. Defined systems engineering processes. Defined and planned work for systems engineering team in support of project needs. Planned and managed capital equipment purchases within the department budget. Managed subcontract engineering efforts.Lead systems engineer for 193nm Micrascan Pilot Tool (MPT) microlithography exposure tool. Exposure tools are typically the largest single capital equipment purchase for a semiconductor fab. The 193 MPT was a leading edge tool designed for use at 180nm minimum feature size and below. Provided all of the high level and substantial portions of low level requirements definition for 193 MPT. Performed initial error budgets for 193 MPT. Reviewed design approaches vs. requirements. Drove baseline design decisions. Performed analysis on critical risk items. Primary technical contact for 193nm Micrascan Pilot Tool. Responsible for delivering systems engineering message at major customer reviews. Major customer reviews include high level participants from all of the "big name" semiconductor manufacturers. Lead systems engineer for high level requirements development on next generation lithography tool and software control system.Successfully transitioned duties to direct reports. Developed a Visual Basic / Microsoft Access based requirements tracing database.

Wilton, Ct

Worked as one of the primary systems engineers on an ARPA sponsored, X-Ray illuminated,proximity printing microlithography tool. As a member of the systems engineering team, Ideveloped the architecture for the functional subsystems, allocated and/or budgeted customerrequirements to those subsystems, translated subsystem requirements into detailed designspecifications, defined all internal and external interfaces to the tool and defined softwarerequirements for this computer controlled precision machine. Responsible for supporting toolintegration and defining and conducting acceptance tests at the factory. Predicted overlay(registration of mask with respect to wafer) and throughput (number of wafers processed per unit time) performance using computer models that I wrote. I participated in formal design reviews with customers and managed over $1.2M in systems engineering tasks.

Technical achievements include the generation of a detailed uncertainty budget for SVGL'sMicrascan II laser gauges, initial development of a 3-dimensional vector based computer model of a generic microlithographic tool, optical design of illumination systems for lithographic applications, polarization and optical design analysis of an angle measuring instrument, mathematical analysis of laser gauges and literature search for commercial zoom lenses.Performed marketing related functions. Met with customers, listened to their needs, madeestimates and proposed solutions to satisfy those needs. Wrote proposals and studied SBIRsolicitations.

Middlefield, Ct

Project optical engineer for the AXIOM 2/20 displacement measuring interferometer product line. Involved in every aspect of the interferometer product design, i.e. defining the product withmarketing, design concept and execution, product production support. Performed metrologysystem design for customers in semiconductor and precision instrument applications. Metrology system design includes layout, detailed uncertainty budgets, thermal coefficients and alignment procedures. Acted as a corporate resource for lens design and R+D work. Performed lens design for research and development, new instruments, outside contracts and engineering support for production systems. Developed a Monte Carlo based lens tolerance analysis program.Performed Research and Development engineering. Translation of customer requirements intoengineering requirements. Performed conceptual design and proof of concept laboratory work for instruments to measure aspheric optical elements and contact lenses.Held a pivotal role in quality improvement activities. Organized a group to help company divisions identify and serve internal customers. Wrote and executed procedures to use Ishikawa diagrams. Wrote and executed troubleshooting procedures to identify and fix production problems so they never re-occur. Made many visits to vendors to form close working relationships.

Dallas, Texas

Responsibilities included the design, analysis, and test of complex visible and infrared (FLIR)optical sensors. FLIR design typically included designing optics for 8 - 12 µm infrared sensor,scanning system, visible display optics and accessories such as laser range finders and TVsensors. Typical design activity included proposal preparation, system trade studies and detailed optical design. Utilized CODE V optical design program. Wrote computer programs to checkphysical parameters and produce drawings of optical elements.Had both production and design responsibility throughout TI career. Production tasks includedsupporting two high volume production FLIR systems.

M. S., Industrial Engineering

Applied Physics