Undergraduate Researcher - Bartels Research Group
- Optimized growth parameters for CVD grown Molybdenum Disulfide thin film on Si/SiO2- Characterized TMD thin films on silicon substrates through Raman and Photoluminescence Spectroscopy to verify sample thickness and quality for device fabrication- Used Nanometer Pattern Generation System (NPGS) for direct write EBL- Presented research findings in.