• Responsible for development of platform portfolio that spans multiple generations of EUV products • Allocation of budget, cost estimates, performance targets, resources, and drive realization of plans• Work with cross sectors sourcing, supply chain, manufacturing, customer support and Marketing to translate current and future needs of EUV source lithography Industrial Recipe into stable, reliable and extendable platform by ensuring maximum commonality forwards and backwards across Product Line & Functions• Responsible for delivering 100kHz control infrastructure that uses FPGA on an SoC, Developed real time embedded Computing platform to meet 1000W high throughput requirements for next generation EUV source systems

• Line manager for software : High Impact group of 40 Engineers responsible for delivering software solutions to ever increasing demand for high throughput and high productivity of EUV Lithography systems. Key technologies: C++, Python, MySQL and Cassandra, Message Queues, XML, VxWorks, Linux, QT, and PLC• Customer: Drive learning mindset within the organization by continuously adopting FMEA, 5Why, 8D techniques and establishing direct customer feedback loops to development teams. Reduction of 10% defect on YoY basis.• Product Roadmap: Own product road map to meet system (and function) needs. Introduced ground breaking System of Chip (“SoC”) FPGA based control platform for future products to meet Customer roadmap of 3nm and beyond. Control loop supports throughput scaling of 100Khz required for High N.A machines that are twice as expensive and twice as productive.• Process: Lead and Championed adoption of Scaled Agile within the company. Setup cross functional, multi-disciplinary teams based on product ownership that resulted in enhanced quality of deliverables, improved operation efficiency and thus customer experience.

• Line Manager for Software Architects working on EUV lithography source system

• Software Architect responsible for providing software technical leadership and direction to a group of software engineers working on EUV lithography systems

• Product: Key contributor to develop next generation Robotics solutions for Semiconductor IC testing. Developed a fairly complex module responsible for transporting devices across several stations within the machine. Introduced several simulation capabilities for Robotics components to reduce development cycle by a factor of 2.• Technology: Key contributor in the migration of Monolithic architecture to micro service oriented architecture based on messaging and pub-sub communication model. Enhanced modularity and scalability. Adapted C#, .NET and WPF UI interfaces.