Gilles Guerrero Email & Phone Number

Munich, Bavaria, Germany

Munich, Bavaria, Germany

Munich Area, Germany

High Voltage Discrete Power MOSFET Technology

Villach, Austria

• Development of automotive switching applications based on power MOSFETs.
• Led overall process integration work: CMOS, power DMOS
• Actively contributed to and coordinated multi-site activities related to:> Devices development, simulation and modeling> Analog IC optimisation: Band Gap, ESD, Active clamp, Sensors, Parasitics> Technology.

Dresden Area, Germany

• DRAM development for 58 and 45 nm technologies:Trench and new Buried WordLine based Technologies
• Led technical teams> Responsible for DRAM capacitor (DT) functionality on 48 and 58 nm> Involved in stack capacitor scalability focus team (Si mold)
• Developed innovative process flows for DT capacitor> Evaluated introduction of new materials (high-k, metal electrodes)> Improved capacitance by 20% and capacitor cost efficiency by 10%
• Implemented a carbon process flow to qualify 58 nm technology> Enabled module robustness, accelerated reliability, and yield learning
• Qimonda Dresden Innovation Award 2008 for the world ‘s first application of conductive carbon as an active material in CMOS flow. > Co-authored four invention disclosures and two papersTo read more about itT. S..

Studied feasibility of VCSEL-based optical tweezers for micromanipulation of biological objetcs in microfluidic channels.

• Developed new concept of active photonic crystals based on Phased-locked arrays of Vertical Cavity Surface Emitting Lasers (VCSEL)
• Photonics, III-V semiconductor
• Laser: modelling & development: VCSELs, photonic crystals
• Optical imaging & characterization: fibers, modulators, detectors, spectroscopy
• Micro-fabrication: RIE, selective oxidation, lithography, PVD, CVD, etc.To read more about it:G. Guerrero, D.L. Boiko and E. Kapon"Photonic Crystal Heterostructures Implemented with Vertical-Cavity Surface-Emitting.