Hanish is proven leader & result oriented semiconductor professional who loves building products. He has built an ardent team of talented Mechanical, Electrical, RF, Power Electronics & Controls engineers and taken complete accountability of end-to-end product development. He is an innovator and lead contributor in developing several disruptive technologies like High Density Plasma Chemical Vapor Deposition (HDPCVD), Sub-Atmospheric Chemical Vapor Deposition (SACVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Flowable Chemical Vapor Deposition (FCVD) & Atomic Layer Deposition (ALD).Hanish has been with Applied Materials for 15+ years and holds master's degree in Energy Management & degree in Mechanical Engineering from University of Calicut and has completed the Executive General Management Program and Leadership & Executive Development Program program from IIMB.