Harry J. Levinson is currently an independent lithography consultant and Principal Lithographer at HJL Lithography. He is also currently an advisor for Silicon Catalyst. Levinson has spent most of his career working in the field of lithography, starting at AMD. He also held positions at Sierra Semiconductor and IBM before returning to AMD in 1994. When wafer operations were spun off from AMD, he moved to GLOBALFOUNDRIES and worked there until mid-2018. During the course of his career, Levinson has applied lithography to many different technologies, including bipolar memories, 64-Mb and 256-Mb DRAM development, the manufacturing of application-specific integrated circuits, thin-film heads for magnetic recording, flash memories and advanced logic. He was one of the first users of 5 steppers in Silicon Valley and was an early participant in 248-nm, 193-nm, and EUV lithography. Levinson served for several years as the chairman of the USA Lithography Technology Working Group that participated in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin-film optical effects and metrics for imaging, to overlay and process control, and he is the author of two other books: Lithography Process Control and Principles of Lithography. He holds over 70 US patents. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. In recognition of his contributions to SPIE, he received the Society’s 2014 Directors’ Award. In 2022 he received the SPIE Frits Zernike Award in Microlithography. He has a B.S. in engineering from Cornell University and a Ph.D. in physics from the University of Pennsylvania. His Ph.D. thesis, titled “Resonances and Collective Effects in Photoemission,” addressed certain phenomena involving the interactions of light and matter. For this work, he received the Wayne B. Nottingham Prize in surface science.