Hamed Hajibabaei Email & Phone Number
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Who is Hamed Hajibabaei? Overview
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Hamed Hajibabaei is listed as Process Engineer at Tokyo Electron US, a with 2315 employees, based in Raleigh, North Carolina, United States. AeroLeads shows a work email signal at tel.com and a matched LinkedIn profile for Hamed Hajibabaei.
Hamed Hajibabaei previously worked as Postdoctoral Research Scientist at North Carolina State University and Postdoctoral Researcher at Michigan State University. Hamed Hajibabaei holds Doctor Of Philosophy - Phd, Inorganic Chemistry And Material Science, 3.82 from Michigan State University.
Email format at Tokyo Electron US
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AeroLeads found 1 current-domain work email signal for Hamed Hajibabaei. Compare company email patterns before reaching out.
About Hamed Hajibabaei
An accomplished chemist with 8+ years of interdisciplinary research experiences spanning on synthetic organic chemistry, martial science, nanomaterial, heterogeneous catalysis, semiconductor thin-film, device physics, surface science, instrumentation, and automation. Currently, I am looking for a scientist or a process engineer position where I can leverage my problem-solving skills to add value and to expand my skills.
Listed skills include Microsoft Word, Microsoft Excel, Chemistry, Research, and 46 others.
Hamed Hajibabaei's current company
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Hamed Hajibabaei work experience
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Postdoctoral Research Scientist
Postdoctoral Researcher
Research Assistant
Michigan State University is a public research university in East Lansing, Michigan. MSU was founded in 1855 and served as a model for land-grant universities later created under the Morrill Act of 1862.Ph.D. Thesis: Investigating semiconductor thin-films for solar-assisted water splittingKey responsibilities:- Conducted original research on the synthesis and characterization of metal-oxide/nitridesemiconductor and transparent conductive substrate thin-films.- Synthesis, characterization, and application of metal oxide catalysts for thermo-catalytic Ammonia Decomposition.- Electrochemical characterization of semiconductor thin films for water oxidation reaction. - Developed new catalysts, process, techniques and procedures.- Analyzed and interpreted data, design experiments, write report, and present data.- Maintained knowledge in field through regular literature reviews and attending conferences.- Initiated and managed several projects and collaborations.- Supervised several undergraduate and first-year graduate students.- Co-authored a book chapter and 10 peer-reviewed publications.- Designed and built multiple instruments including a fully automated ALD, spray pyrolysis, and a fixed bed flow reactor.- Maintenance of several instruments including Atomic Layer Deposition (ALD), thermal evaporator, potentiates, UV-Vis spectrometer, and vacuum pumps and lines.- Worked as a safety coordinator to maintain a safe research environment by following and enforcing university safety policies in the lab.
Teaching Assistant
As a TA, my primary responsibilities were to teach undergraduate level courses and labs including general chemistry and organic chemistry labs, holding office hours for 2 hours per week: - Interacted with students helping them to resolve complex problems.- Attended lectures, transcribed and provided notes to students, proctored and graded exams, maintained grades, and provided review preparation for the final exam.
Teaching Assistant
As a TA, my primary responsibilities were: - Teaching undergraduate level courses and labs including general chemistry and inorganic chemistry labs.- Holding weekly office hours to meet with the students.- Grading assignments, and respond to students questions.
Colleagues at Tokyo Electron US
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Robert Tetrault
Colleague at Tokyo Electron UsBeacon, New York, United States
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Michael Grant
Colleague at Tokyo Electron UsAustin, Texas, United States
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Ethan Tappe
Colleague at Tokyo Electron UsPortland, Oregon, United States
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Edgar Valle-Torres
Colleague at Tokyo Electron UsSalt Lake City, Utah, United States
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Toshio Saegusa
Colleague at Tokyo Electron UsJapan
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Christine Haynes-Medrano
Colleague at Tokyo Electron UsMaricopa, Arizona, United States
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Hector Espino Jr.
Colleague at Tokyo Electron UsMesa, Arizona, United States
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Bergen Anderson
Colleague at Tokyo Electron UsUnited States
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Mark Sanders
Colleague at Tokyo Electron UsMechanicville, New York, United States
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Phil Workman
Colleague at Tokyo Electron UsGreater Minneapolis-St. Paul Area, United States
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Hamed Hajibabaei education
Doctor Of Philosophy - Phd, Inorganic Chemistry And Material Science, 3.82
Master Of Science (M.S.), Inorganic Chemistry
Bachelor'S Degree, Chemistry
Frequently asked questions about Hamed Hajibabaei
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What company does Hamed Hajibabaei work for?
Hamed Hajibabaei works for Tokyo Electron US.
What is Hamed Hajibabaei's role at Tokyo Electron US?
Hamed Hajibabaei is listed as Process Engineer at Tokyo Electron US.
What is Hamed Hajibabaei's email address?
AeroLeads has found 1 work email signal at @tel.com for Hamed Hajibabaei at Tokyo Electron US.
Where is Hamed Hajibabaei based?
Hamed Hajibabaei is based in Raleigh, North Carolina, United States while working with Tokyo Electron US.
What companies has Hamed Hajibabaei worked for?
Hamed Hajibabaei has worked for Tokyo Electron Us, North Carolina State University, Michigan State University, and Sharif University Of Technology.
Who are Hamed Hajibabaei's colleagues at Tokyo Electron US?
Hamed Hajibabaei's colleagues at Tokyo Electron US include Robert Tetrault, Michael Grant, Ethan Tappe, Edgar Valle-Torres, and Toshio Saegusa.
How can I contact Hamed Hajibabaei?
You can use AeroLeads to view verified contact signals for Hamed Hajibabaei at Tokyo Electron US, including work email, phone, and LinkedIn data when available.
What schools did Hamed Hajibabaei attend?
Hamed Hajibabaei holds Doctor Of Philosophy - Phd, Inorganic Chemistry And Material Science, 3.82 from Michigan State University.
What skills is Hamed Hajibabaei known for?
Hamed Hajibabaei is listed with skills including Microsoft Word, Microsoft Excel, Chemistry, Research, Data Analysis, Semiconductors, Atomic Layer Deposition, and Thin Film Characterization.
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