Kenneth Goldberg Email & Phone Number

Berkeley, California, United States

Berkeley, California, Usa

I develop x-ray optics techniques and instrumentation for the Advanced Light Source (ALS), and its upgrade to become a diffraction-limited storage ring (ALS-U)

Lawrence Berkeley National Laboratory, Berkeley, California

Berkeley, Ca

I specialize in the development of technologies for EUV and soft X-ray wavelengths, including lithography, interferometry, imaging, beamlines, and experimental systems. I served as the principal investigator for the SEMATECH Berkeley Actinic Mask Inspection tool (called the AIT), and the SHARP EUV Mask Imaging Microscope. I have been a 'beamline scientist' the Advanced Light Source's Beamlines 12.0.1 and 11.3.2 where I was responsible for research operations, scheduling, budget, safety, and scientific output.

Berkeley, California, Usa

I led the team developing plans for the beamlines and experimental systems from the Conceptual Design phase into the Preliminary Design phase.

I started Kanayama Consulting to develop software for image data analysis, and consult on issues in the field of optical testing. KanayamaConsulting.com

San Jose, California, Usa

I served as Conference Chair for four years, organizing the program committee to set the scope, review abstracts, create the program, and run the meeting. This has been an especially exciting period as the technology moved into commercialization for the first time.

Berkeley, California, Usa

Lawrence Berkeley National Laboratory

Lawrence Berkeley National Laboratory, Berkeley, California

The SHARP microscope (SHARP High-NA Actinic Reticle review Project), now under construction, will become the most advanced EUV microscope dedicated to EUV lithography photomask research. Featuring customizable coherence control, and variable resolutions, SHARP will give lithographers in the semiconductor industry a window into chip-making processes generations ahead of other tools. SHARP will replace the AIT microscope now operating at LBNL's Advanced Light Source.

Berkeley, Ca

The AIT is a SEMATECH-funded worldwide unique EUV microscope dedicated to EUV lithography photomask research. It operates with EUV light on a synchrotron bending-magnet beamline at LBNL's Advanced Light Source. The AIT is used to measure mask and pattern properties, native and programmed defects, and to calibrate non-actinic (i.e. non-EUV-wavelength) mask measurement techniques.

The Center for X-Ray Optics is a unique research group within the Materials Sciences Division of Lawrence Berkeley National Laboratory. Our focus is on the development of world-leading experimental systems for short-wavelength, extreme ultraviolet and x-ray nano-science.

Berkeley, Ca

Representing the 2000+ members of the ALS User Community to the Department of Energy and the ALS Management.

Ph.D., Physics

Physics, UC Berkeley

A.B., Physics And Applied Mathematics

Activities and Societies: Phi Kappa Tau Fraternity, Society of Physics Students