Specialties: Optical Physics, Synchrotron Instrumentation, Beamline Optical systems, Extreme Ultraviolet (EUV) Lithography, Wavefront Sensing, Coherence, Interferometry, Adaptive X-Ray Optics (AXO), Wavefront Sensing, Microscopy, Diffractive Optics, Optical Modeling, EUVL Masks, Mask Imaging, IDL.I am proud to lead the Photon Science Development Group lead at the Advanced Light Source (ALS), at Lawrence Berkeley National Laboratory (LBNL). My group develops experimental systems for science, including x-ray optics and beamlines, gratings, detectors, control systems, and advanced computing. We also develop endstations and sample environments.Previously, I led the diagnostics Working Group for the Advanced Light Source Upgrade (ALS-U) through the preliminary and final design phases. This is a US Department of Energy project to revitalize the Advanced Light Source, and transform it into a state of the art, diffraction-limited soft x-ray light source. I led the Beamlines and Optical Systems group within the ALS-U project through the conceptual design phase (CD-0 to CD-1).I was the Deputy Director of LBNL's Center for X-Ray Optics from 2009 through 2015. Until 2016, my work centered around the development and demonstration of technologies for extreme ultraviolet lithography, the dominant chip-making technology now in use. I developed and ran tools for optics testing, photoresist development, and photomask imaging. I served four years as chair of the SPIE Advanced Lithography's EUV Lithography conference (2016-2019), the world's largest annual conference on EUV Lithography technologies. I was the program committee chair for Experimental Systems at the 6th Diffraction-Limited Storage Ring Workshop, held at Lawrence Berkeley National Laboratory, October 29-31, 2018.