Field Application Engineer
Current• Working with the first Fab of TSMC (F21) in USA in a startup environment• Completed Process readiness of DUV Lithography machines and completed Yield star tool matching in TSMC Fab F18, Taiwan• Completed all core courses related to imaging, overlay, defectivity and productivity to enhance expertise on lithography machines• Served as lens specific calibration lead for Fab 21 TSMC and completed LSC on 6 machines in TSMC Fab.• Regularly delivered (KTs) to TSMC and litho problem updates• Solved 8 live cases for TSMC related to overlay and imaging• Completed 4 months of intensive training in Taiwan ASML.• Internal tool expertise for data analysis: OMAT, Alignment analyzer, FLAT, MDL browser, Lithotuner, DFtwin, Boombox