I am a litigation partner at Holland & Knight. My practice focuses on intellectual property litigation and counseling. I work with clients in such diverse fields as electronics, semiconductor manufacturing and development, software, telecommunications, transportation, entertainment, retail and consumer goods, and financial transactions. I have extensive experience in all aspects of federal district court litigation and International Trade Commission (ITC) investigations and trials. I also served for nearly five years as the Managing Partner of my prior firm's Shanghai Office, and have extensive experience advising companies throughout Asia.As a registered patent attorney, I also specialize in post-grant proceedings before the United States Patent Office, having served as lead counsel in over 50 inter partes review (IPR) proceedings before the Patent Trial and Appeal Board (PTAB).I have been named a top litigator by IAM Patent 1000 – The World's Leading Patent Practitioners; recognized by The Best Lawyers in America® for both Patent Litigation and Intellectual Property Litigation; and recognized multiple times as a “Super Lawyer” for Intellectual Property Litigation. I have been selected by Law Week Colorado to its "Barrister’s Best" list as the "People’s Choice" for Best IP Litigator, having previously been named a "Top Litigator" by Law Week Colorado. I have also been named as a "Stand-out Lawyer" by Thomson Reuters on being recognized by my clients as an outstanding lawyer.Before joining the firm, I completed a federal clerkship with the Honorable Robert C. Jones of the United States District Court for the District of Nevada.Prior to joining the legal profession, I worked as a software engineer for one of the nation’s largest technology companies, developing cutting-edge design automation tools for VLSI microprocessor design. I also worked as a researcher for the National Institute of Science and Technology in Boulder, Colorado, conducting research into next-generation wireless standards and measurement techniques.