My research area focuses on wide-bandgap (WBG) and ultra-wide-bandgap (UWBG) device processing, material characterization, device testing, and optoelectronics. My work involves advancing the next generation of semiconductor technologies through innovative fabrication techniques and thorough performance evaluations. I work in a cleanroom environment, utilizing advanced microfabrication tools including the Heidelberg mask writer, maskless aligner, ICP/RIE dry etching, electrochemical etching, plasma cleaner, e-beam evaporator, thermal evaporator, and PECVD. My role involves precise fabrication processes critical to developing next-generation semiconductor devices.