Michael Current
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Michael Current Email & Phone Number

Chief Technology Officer at Sillicon Genesis
Location: San Jose, California, United States 15 work roles 1 school
2 work emails found @phoenixnuclearlabs.com 5 phones found area 408, 512, and 650 LinkedIn matched
✓ Verified Jul 2026 4 data sources Profile completeness 100%

Contact Signals · 2 work emails · 5 phones

Work email c****@phoenixnuclearlabs.com
Direct phone (408) ***-****
LinkedIn Profile matched
3 free lookups remaining · No credit card
Current company
Sillicon Genesis
Role
Chief Technology Officer
Location
San Jose, California, United States

Who is Michael Current? Overview

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Quick answer

Michael Current is listed as Chief Technology Officer at Sillicon Genesis, based in San Jose, California, United States. AeroLeads shows a work email signal at phoenixnuclearlabs.com, phone signal with area code 408, 512, 650, and a matched LinkedIn profile for Michael Current.

Michael Current previously worked as Physicist at Current Scientific and Member Technical Advisory Board at Phoenix Nuclear Labs, Llc. Michael Current holds Phd, Physics from Rensselaer Polytechnic Institute.

Company email context

Email format at Sillicon Genesis

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{last}@phoenixnuclearlabs.com
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AeroLeads found 2 current-domain work email signals for Michael Current. Compare company email patterns before reaching out.

Profile bio

About Michael Current

Michael Current is a Chief Technology Officer at Sillicon Genesis. They possess expertise in thin films, metrology, semiconductors, silicon, semiconductor industry and 45 more skills. Colleagues describe them as "He has very broad knowledge and is a very well known expert on ion implantation. He also is very friendly and has put a lot of effort inorganizing conferences."

Listed skills include Thin Films, Metrology, Semiconductors, Silicon, and 46 others.

Current workplace

Michael Current's current company

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Sillicon Genesis
Sillicon Genesis
Chief Technology Officer
15 roles · 53 years

Michael Current work experience

A career timeline built from the work history available for this profile.

Chief Technology Officer

Current
Sillicon Genesis

Fremont, California, United States

Using high dose proton ion implantation for layer transfer of ≈2 um CMOS layers to form 3DICs and related devices.

Feb 2015 - Present

Physicist

Current
Current Scientific

Technology writing and education Consulting on IC fabrication processing

2007 - Present ~19 yrs 6 mos

Member Technical Advisory Board

Madison, Wisconsin Area

Technical advisor related to the use of high-flux proton beams.

Aug 2017 - Aug 2024

Visiting Professor

Tainan City, Taiwan

Visiting professor in Electrical Engineering. Taught semester course on "metrologies for electronic and nano-scale materials" and numerous local lectures on topics in ion implantation. Advised students on research in quantum confined Si films and fins and on ALD of metals.

Aug 2015 - Dec 2015

Member Technical Advisory Board

Semequip/Ceradyne

Billerica, Ma

Technology advisor related to the development and applications for the use of large molecular and multi-atom species for ion implantation.

2007 - 2013 ~6 yrs

Dir Technical Marketing

Frontier Semiconductor

Development and Applications for RsL (sheet resistance & leakage) and EOT (micro-probe dielectric) metrologies.Marketing & Applications for diverse measurement systems.

2003 - 2007 ~4 yrs

Dir Technical Marketing

Process Engineering and Applications for SOI and other laminated materials

1999 - 2002 ~3 yrs

Senior Scientist, Ion Implantation Division And Dean Of Engineering, Applied Global University

Santa Clara, Ca And Austin, Texas

Ion implantation processingCorporate technical education

Apr 1986 - 1998

Visiting Professor, Ion Engineering Laboratory, Electrical Engineering

Kyoto University

Kyoto, Japan

Ion implantation and thin film deposition with atomic, molecular and cluster ions.

Aug 1990 - Jul 1992

Senior Scientist

Xerox Parc

R&D in dielectric films, MeV implant process

1984 - 1986 ~2 yrs

Implant And Yield Engineer

Trilogy Systems

Ion Implant operations manager & split-shift operator.Wafer-scale yield test & analysis.

1982 - 1984 ~2 yrs

Technical Staff

Implant process engineerRs mapping metrology

1980 - 1982 ~2 yrs

Research Faculty, Materials Science & Engineering

FIM-based studies of radiation damage in metals

1976 - 1980 ~4 yrs

Postdoc, Materials Science & Engineering

Rensselaer Polytechnic Institute

Troy, New York

Molecular beam kinetics studies of V catalytic reaction rates to form H2SO4 in oil-burning power generation plumes.

1974 - 1976 ~2 yrs
1 education record

Michael Current education

FAQ

Frequently asked questions about Michael Current

Quick answers generated from the profile data available on this page.

What company does Michael Current work for?

Michael Current works for Sillicon Genesis.

What is Michael Current's role at Sillicon Genesis?

Michael Current is listed as Chief Technology Officer at Sillicon Genesis.

What is Michael Current's email address?

AeroLeads has found 2 work email signals at @phoenixnuclearlabs.com for Michael Current at Sillicon Genesis.

What is Michael Current's phone number?

AeroLeads has found 5 phone signal(s) with area code 408, 512, 650 for Michael Current at Sillicon Genesis.

Where is Michael Current based?

Michael Current is based in San Jose, California, United States while working with Sillicon Genesis.

What companies has Michael Current worked for?

Michael Current has worked for Sillicon Genesis, Current Scientific, Phoenix Nuclear Labs, Llc, Santa Clara University, and National Cheng Kung University.

How can I contact Michael Current?

You can use AeroLeads to view verified contact signals for Michael Current at Sillicon Genesis, including work email, phone, and LinkedIn data when available.

What schools did Michael Current attend?

Michael Current holds Phd, Physics from Rensselaer Polytechnic Institute.

What skills is Michael Current known for?

Michael Current is listed with skills including Thin Films, Metrology, Semiconductors, Silicon, Semiconductor Industry, Ion Implantation, Ic, and Characterization.

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