Developing Optical Endpoint Monitoring system.Optical process development for sputtering and IBS systems

Consultant for multiple development projects within Evatec.

Lead role in the developement of a magnetron source for Evatec’s sputter cluster platform. Designed RF biased substrate holders for ion assisted deposition, improving step coverage in temperature-compensated (TC-SAW) filters and other applications.Implemented reactive process control systems increasing deposition rates by 200-300%.

Designed a PECVD reactor with a focus on manufacturability and layer uniformity for 1.5m2 substrates. Received a company award for contributing to the thin-film world record.Developed a quality control diagnostic to improve the manufacturability of the reactor in view of its industrial production.

Developed a PECVD reactor from the conceptual sketches up to a semi-industrial prototype. The final product met the technological challenge of film quality, uniformity and stability.Engineered a wide panel of reliable plasma diagnostics to measure and improve the properties of the PECVD reactor. IOP journal editors selected the resulting publication to be included in “IOPselect” for its significant impact and influence on future research.Independently implemented a plasma simulation with COMSOL to support the reactor development. Simulation and experiment results were in excellent agreement.

Developed process for tack time reduction of both the thin film deposition process and a plasma enhanced etching process.Engineered a method to quantify the amount of particles produced by the PECVD reactor. This allowed us to develop a cleaner process and reduce negative health impacts.Improved troubleshooting procedures through systematic investigation of reactor failures and supervised customer on-site repairs in Germany to the full satisfaction of all parties.