Principal Algorithms Architect
CurrentAt ASML/Cymer, as one of the most senior members of its technical team, I architect and lead the development of control algorithms for extremely complex Extreme Ultraviolet light sources enabling the new generation of lithography tools for semiconductor manufacturing•Founding Functional Architect for the core Energy and Timing Control subsystem of the extremely complex EUV light source during critical years of development culminating in its adoption for HVM by chip makers•Led the formation of the functional organization by defining its scope, and by leading definition and adoption of processes and SOPs for its technical, project execution and management aspects•Provided top-level architectural and technical leadership for teams of up to fifty highly skilled controls, SW, FW and HW engineers in the development of all aspects of the EUV generating plasma control system, including its contribution to die yield, man and machine safety, UIs, CoGs, etc.•Responsible for definition and maintenance of the functional roadmap and its alignment with product development programs and other organizational stakeholders•Responsible for project and program planning and execution, definition and control of scope meaningfully aligned with the breakdown of technical content to promote execution efficiencies •Served as competence leader, responsible for management of performance, technical engagements, career and professional development for a group of fifteen highly skilled Controls Experts•Initiated, led adoption, and ensured team’s adherence to the best engineering and quality assurance practices in all aspects and phases of the product development, including Requirements Engineering in the definition phase, budget driven control systems design in the development phase, statistical rigor during verification and integration phases•Represent team in Key Decision meetings with stakeholders on all technical, project and program initiation and planning activities and decisions