Process Development Engineer (Metrologist)
Santa Clara, California, Us
2004 - 2010 Process Development Engineer (Metrologist)Designed and conducted experiments aimed at evaluating new technology capabilities and or equipment that would be used in the next generation of microprocessor manufacturing (evaluated equipment based on safety, precision, accuracy, output, and mean time between failures, maintenance durations, support costs, and technological depreciation).Wrote hundreds of white papers and specifications aimed at documenting the implementation of new technologies and or capabilities, as well as aid users and technicians at using and maintaining the equipment.Successfully transferred measurement technologies and capabilities to Intel Fabs around the world (Israel, Ireland, multiple locations in US).Developed and maintained matching methodologies (Six Sigma) that created an optical metrology measurement fleet that consisted of over 20 tool sets with precision variation that was undetectable by users. Maintained a working relationship with KLA-Tencor, Bio-Rad, and Rudolph (including field and application engineers) to increase tool performance on a continuous basis, which resulted in safety innovations and measurement algorithm inventions.Characterized and delivered dispersion models for many proprietary exotic thin films used in back end chip fabrication process. Trained new engineers on matching and maintenance methodologies for optical measurements across the tool set fleet.1998 - 2004 Engineering TechnicianImplemented a golden algorithm library drive for the back end transparent thickness measurement equipment, serving as a universal measurement standards saving thousands of engineering hours in troubleshooting measurement mismatches.Performed the install and qualification on two high resolution profiler equipment sets to support planar front and back end process improvements.Performed the process qualification of transparent film thickness equipment to support back end lithography production.