With a passion for plasma physics and thin film deposition, I am a Process Engineer at Applied Materials, where I develop and optimize PVD processes for thin film and semiconductor device fabrication. I also contribute to the reliability and process improvement of the PVD & PECVD system, using SPC to control and monitor the process parameters and outcomes. I have successfully delivered high-quality thin films for various applications, such as logic, memory devices, and sensors.I did my Ph.D. in Development of Inductively Coupled Plasma System, its Diagnostics and Application at Indian Institute of Technology, Bombay. I have designed and built a large area ICP system and performed diagnostics experiments using various probes to measure the plasma density, electron temperature, and plasma potential. I have also fabricated and characterized device quality amorphous silicon films using the ICP system, achieving high deposition rates and low defect densities. I have published two papers in IEEE journals on my research findings, demonstrating my expertise and innovation in plasma processing and its applications. I have a strong background and interest in plasma physics, thin film deposition and characterization, semiconductor device fabrication, and vacuum system design and maintenance. I have acquired multiple certifications in machine learning and teamwork foundations to enhance my skills and knowledge. I am an innovative and energetic scientist who is passionate about advancing the field of plasma processing and its applications.