Her research interests includes CMOS Technology, Memory and Logic Devices, Alternate Semiconductors, High-k Dielectrics, Materials, Semiconductor Devices, Nano/Micro electronics, Device Characterizations, Thin film depositionsDissertation Title: Integration of Facile DUV Irradiated High-κ Dielectrics on Indium Oxide Channel for Field-Effect Transistors TechnologyWorks:#Solution-Processed ZrO2/In2O3 for Low Voltages FET Applications#Thermal Solution-processed Al2O3/In2O3 Interdigitated Channel Field Effect Transistors#Low thermal budgets HfO2/In2O3 Interdigitated Channel Field Effect Transistors#Thermal solution process Interdigitated Channel La2O3/In2O3 Field Effect Transistors#DUV Irradiated Y2O3/In2O3 Interdigitated Channel Field Effect Transistors#Copper-Metal-Organic-Nanocluster-based Gate Dielectric for CMOS Applications#Lanthanum oxide/silicon oxynitride-based gate stack performance enhancement due to ultrathin oxynitride interfacial layer for CMOS applications#Nanoscale Probing of Surface Charges in Functional Copper-Metal Organic Clusters by Kelvin Probe Force Microscopy for Field-Effect Transistors#TFA doped In2O3 photodetectors for Deep Ultra Violet ApplicationsSkill Set:Class 100 Clean Room, Materials, Thin film depositions, Material Synthesis, Integration, Semiconductor Device Physics, Electrical Characterizations, Physical Characterizations, Vacuum Technology, Device Egineering, CMOS Technology, Memory, Logic devices, VLSI Technology and Practicum, Microfabrication, High-κ Dielectrics, Alternate Channel Material, RF/DC Sputtering, ALD, Keithley Semiconductor Characterization System-SCS, Four probe systems, Contact angle, XPS, XRD, Raman, EDS, REELS, Stylus & Optical profilometer, FE-SEM, HR-TEM, AFM, Ellipsometry, Electron-Beam Lithography (EBL), Maskless Lithography, Ellipsometry, Optical profilometer, Thermal Oxidation Furnace, Thermal evaporator