Leading Dry Etch 3D Xpoint development starting with transfer from R&D, development through different quality/performance grades, and to yield targets. My team supported development on both N and N+1 nodes.

-Leading development of N+1 node technology toward manufacturing readiness-Responsible for the transfer of new technologies/nodes from R&D to HVM-Site champion for MOR-POR gaps on N+1 nodes – tracking and projecting potential capital risks and closures-Initial team creationSelected as a Senior Manager for the creation of an Alpha Technology Engineering (ATE) team focused on technology development at IM Flash. Shortly after this team formed, the end of the Joint Development Program (JDP) with Intel was announced. Certain team members were hired by a respective parent in similar roles to help close the scope of work for the JDP. I converted to Micron in an org called the Lehi Technology Center.

-Transfer new generation technologies from the R&D facility-Lead successful focus teams to drive process margin, Cpk, and yield improvements in the Wordline module with multiple fabs and departments-Lead successful focus team to develop temporary mitigation actions and a long term etch process change for an etch poor in defects and mask margin with multiple fabs-Implement run-to-run strategies, critical parameter tracking, and CD/defect sample plans with corresponding response actions for new technologies-Mentor, train, and guide new engineers on the legacy part sustaining team-Consistently benchmark in almost every category for the DDE/RES workstations across the Micron network-Sustain line manufacturing, track defects, monitor SPC, react to deviations, coordinate with other departments to solve issues-Drove many capacity requirement reduction project conversions, availability improvements, and second source part qualifications-Created fault reaction mechanisms, SPC deviation reactions, targeting procedures-Developed and implemented run-to-run strategies including a new methodology for using hybrid metrology between optical and SEM CD tools for run-to-run control and Cpk improvements