Sung-Min Ahn Email and Phone Number
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Sung-Min Ahn personal email
Currently, I'm working at Maydan technology center, Applied Materials, Sunnyvale CA—developing advanced material-based process integration and technology[device(3D structures) and process(new materials, sub atomic-level precision films and tight pitch etching process)] of STT/SOT- MRAM, and hybrid memory architect for Artificial Intelligence Memory. Especially, considering my interest in Ultimate-Energy Devices to efficiently realize the energy efficient computing for Artificial Intelligence Memory applications, I am mostly interested in developing novel materials and thin film processing for Ultra-low-energy magnetization (M) switching and Phase changing for Neuromorphic computing in 3D-emerging memory.So far, I have over 15 years experience of materials synthesis/thin-film nanotechnology based device integration and modeling(TCAD and Atomistic) for Major memory leading to Non-Volatile Memory Solutions as well as research and development of II-VI(HgTe/CdTe/ZnTe-based) crystal growth and III-V(GaN/GaAs-based) compound semiconductors[i.e., X-ray, Gamma-ray detector, GaN-based power device, Quantum functional structures(Quantum dots/wires/well), GaAs-based Dilute Magnetic Semiconductor, etc.] for multifunctional photonic, spintronic, MEMS/NEMS devices using various fabrication methodologies—Transferring Heater Method (THM) for single crystal growth, Molecular Beam Epitaxy (MBE) and thermal evaporation for II-VI, Metal Organic Chemical Vapor Deposition (MOCVD) for III-V, and ALD/PVD(RF/DC magnetron sputtering) for magnetic/transition metal. My work has mainly covered from material synthesis to characterization, optimization for logic and emerging memory devices based MRAM, PC-RAM, and hybrid applications.
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Research ProfessorPohang University Of Science And TechnologySunnyvale, Ca, Us -
Research ProfessorPohang University Of Science And Technology Nov 2021 - PresentPohang, Gyeongsangbuk-Do, KrDevelopment of 8-inch process for Advanced Process and Technology for Novel devices like FeFET, STT/SOT-MRAM, Spintronic Physical Unclonable Function (PUF), and CMOS Co-integration(FEOL/BEOL)1. Development of high-k gate dielectric, low-resistance source/drain, new channel material and device structure for sub-3nm technology node2. Development of Ultra-Low Power, High Density Racetrack memory with ALD-based novel magnetic materials3. Development of ALD-based Low Power, Spintronic Physical Unclonable Function (PUF) and 3D SOT-MRAM for CMOS Co-integration(BEOL)4. Development of ALD-based FeFET (MFMIS, MFIS, MFM) for CMOS Co-integration(FEOL/BEOL) 5. Development of Laser Spike Annealing process for CMOS Co-integration(FEOL/BEOL) of beyond-3nm novel system semiconductor -
Technical ManagerNova Ltd. Sep 2020 - Oct 2021Rehovot, IlDevelopment of materials metrology for Advanced Process and Technology for Mainstream memory (DRAM, VNAND), Logic (3nm-GAA, nanosheet/MBCFET@Samsung), and New memory (PRAM, MRAM@Samsung)1. Development of novel Materials metrology (SIMS, XPS, and Raman spectroscopy) for 3nm-GAA applications2. Development of Raman spectroscopy for thin film-based process (PVD/CVD/ALD) for OTS/GST and MTJ integration3. Development of Materials metrology (nanosheet/MBCFET) for 3nm-GAA applications -
Senior Process Engineer(New Technology Leader)Applied Materials Aug 2019 - Aug 2020Santa Clara, Ca, UsDevelopment of 300-mm FAB based Advanced Process and Technology (process integration, damage-free etch) for AI devices of HBM (High Bandwidth Memory) with Embedded MRAM integration 1. Development of MTJ stacking and bottom electrode for minimizing SW-redeposition of STT/SOT-MRAM using 300-nm AMAT Endura2. Development of Metal/Oxide (Metal oxide)/Magnetic thin film-based process (PVD/CVD/ALD) for MTJ integration using 300-nm AMAT Endura3. Development of novel etching technology (IBE w/dual and quad optic, RIE w/new chemistry, IBE+RIE, etc.) for damage-free MTJ stacks in tight pitch MRAM integration using 300-nm AMAT tools (Endura, etc.) -
Principal Research Engineer(New Memory Group Leader)Samsung Electronics Apr 2014 - Jul 2019Suwon-Si, Gyeonggi-Do, KrAdvanced Technology Development for Process integration of PRAM and MRAM1. Metal/Oxide (Metal oxide)/Magnetic/Compound semiconductor thin-film based process (PVD/CVD/ALD) and device integration for next-generation Non-Volatile devices (STT-MRAM and PC-RAM)2. Material-based Engineering and Characterization of novel materials and MTJ stacks in low-power STT/SOT-MRAM, and functionally doped GST/OTS in PCRAM for highly integrated Non-Volatile Memory Solutions3. Co-optimization of design and technology (Device Performance, Yield, and Reliability achievement) by TCAD-based Device/Process simulations with DFT modeling -
Postdoctoral Associate(Senior Research Scientist)Massachusetts Institute Of Technology Jan 2012 - Feb 2014Cambridge, Ma, Us1. Development of metal/oxide thin-film based magnetic tunnel junction for “Low-Energy Magnetic Domain Wall Logic (NSF-EECS-1101798)” and magnetic sensors (Magnetostictive TMR, STO, etc.) -Transition metal oxide thin films, such as MgO, Ta2O5, and HfO2 using RF and reactive sputtering.-Structural inversion asymmetric (SIA) materials, such as Ta(Gd, W)/CoFe(B)/MgO, Pt/Co/MgO, and Pt/Co/HfO2, using DC- and RF-sputtering.-Pulsed Laser Deposition(PLD) for rare earth iron garnet films, magnetically substituted perovskites, and nanocomposite oxides, and RF/DC Physical Vapor Deposition (PVD, i.e., magnetron sputtering) for magnetic/transition metal- Observation of magnetic domains and magnetization reversal dynamics in magnetic structure(i.e., MTJ, nanowires, etc.) using longitudinal/polar magneto-optical Kerr effect(MOKE),Experimental characterizations and analysis :-E-beam based measurements: SEM, XPS, SIMS, and EDS.-Surface(roughness/grain distribution) analysis: AFM and HR-AFM.2. Development of low energy magnetic devices with MTJ: Static and dynamic (i.e., chiral domain wall) spin configuration leading to spin-text generation(i.e., skyrmion) for low-energy magnetization switching and novel material/stacking optimization for realizing magnetic computing in magnetic nanostructuresIntensive X-ray study on interface structures of multilayered stacks-X-ray Reflectivity and Fluorescence (XRR and XRF) measurements.-Grazing-incidence x-ray diffraction (GIXD) measurements. -X-ray diffraction response of crystallized 3- and 2-D materials depending heat treatments. -
Postdoctoral Research Assistant(Research Scientist)Paris-Sud University (Paris Xi) Dec 2010 - Dec 2011Orsay, Ile-De-France, FrDevelopment of magnetic thin-film nanowires for High Density Non Volatile Memories (European FP7 program through contract MAGWIRE number 257707) -Nanomagnetic materials, such as CoFe(B)/MgO, Co/Pd, and Co/Pt, including nano-scale thin films and nanowires using e-beam evaporation, and sputtering.-RF/DC Physical Vapor Deposition (PVD, i.e., magnetron sputtering) for magnetic/transition metal and Pulsed Laser Deposition(PLD) for piezoelectric films like Lead-Zirconate-Titanate(PZT), ZnO, and AlN.-Measurement of magnetic domains and magnetization reversal dynamics in magnetic structure(i.e., MTJ, nanowires, etc.) using longitudinal/polar magneto-optical Kerr effect(MOKE) and extraordinary Hall effect(EHE) -
Senior EnginererSamsung Electronics Oct 2005 - Feb 2008Suwon-Si, Gyeonggi-Do, KrProcess Architecture(PA) of CMOS Image Sensor for highly integrated systems (CMOS process architecture)Research and Development of 7.2M CMOS Image Sensor and camera processor for highly integrated systems (CMOS process architecture)1. Development of Photo/Clean/Etch/Ion implantation process for Photo Diode and APS (active pixel sensor)2. Development of Photo/Clean/Etch process for embedded Color Filter integration -
Research ScientistGwangju Institute Of Science And Technology Jan 2002 - Aug 2002Research and Development of GaN-based light emitting display(Superluminescent Green/White LEDs)-Growth of III-V based optoelectronic materials, such as GaN/InGaN (AlGaN) using Metal Organic Chemical Vapor Deposition(MOCVD) system.
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Ph.D. Research ScientistKorea Advanced Institute Of Science And Technology Sep 2000 - Dec 2001Research and Development of optical packet switch and light source (III-V-based: GaN) for optical internet
Sung-Min Ahn Skills
Sung-Min Ahn Education Details
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Seoul National UniversityPhysics -
Korea UniversityPhysics -
Korea UniversityPhysics
Frequently Asked Questions about Sung-Min Ahn
What company does Sung-Min Ahn work for?
Sung-Min Ahn works for Pohang University Of Science And Technology
What is Sung-Min Ahn's role at the current company?
Sung-Min Ahn's current role is Research Professor.
What is Sung-Min Ahn's email address?
Sung-Min Ahn's email address is su****@****mit.edu
What schools did Sung-Min Ahn attend?
Sung-Min Ahn attended Seoul National University, Korea University, Korea University.
What are some of Sung-Min Ahn's interests?
Sung-Min Ahn has interest in Science And Technology.
What skills is Sung-Min Ahn known for?
Sung-Min Ahn has skills like Nanofabrication, Manetic Magnetic Thin Film Growth, Nanomagnetism, Nanomaterials, Compound Semiconductors.
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