Scott Jessen Email & Phone Number

Distinguished Member of Technical Staff, TEXAS INSTRUMENTS, Dallas, TX 2002-presentAs principal investigator for the contact lithography level at TI, solved difficult physics problems which enabled TI to mass produce transistors.• Explored design rule space for 22 nm node using a double pattern approach through lithography simulation.• Used lithography simulation to determine key design rules for advanced lithography nodes and empirically verified results.• Architected a novel contact lithography level using rules based optical proximity correction and sub resolu-tion assist features and delivered it to a manufacturing line.• Developed a customized illumination source for imaging and delivered it to manufacturing lines.• Introduced focus drilling techniques to manufacturing lines for contact pattern.• Photoresist and SPC Champion for Development Group.Member of Technical Staff, LUCENT TECHNOLOGIES/BELL LABS, Orlando, FL 1997-2002As a Member of Technical Staff, lead development teams to create new dual damascene process for transistor chip fabrication.• Responsible for development and transfer of BEOL photolithographic resist and imaging processes using both conventional and copper dual damascene/low-k interconnect structures for technology nodes from 300 to 100 nm. Activities require close teamwork with film deposition, dry etch, chemical mechanical polishing and process integration specialists.Specialties: SKILLS• Nikon and ASML scanners and steppers at 193 nm, 248 nm and i-line wavelengths.• DNS and TEL tracks.• Hitachi and AMAT CD SEMS.• KLA overlay tools. • Expert simulator using PROLITH and Solid-C simulation software.• Synopsys, Brion and Luminescent OPC and SRAF modeling tools.• JMP statistical analysis software.• In depth knowledge and understanding of 6-sigma statistics. • Considered expert in the field of photoresist chemistry and evaluation. • Fluent in German.

Listed skills include German, Semiconductors, Ic, Metrology, and 22 others.