Takeo Watanabe received his Ph.D. from Osaka City University in 1990. He is now Emiritus Professor and Professor, University of Hyogo. His expert fields are physics, chemistiy, nuclear science, computer science, optics, photolithography, semiconductor device and its fabrication process, nanotechnology, and synchrotron science and its application. He has been in the field of EUV lithography stage since 1993. So he has over 26-years experience in EUV lithography from the early stage of X-ray projection lithography (present EUVL). He has authored over 200 technical papers. From 1997 to 2001, he designed three-aspherical-mirror system employed as an optics of EUV exposure tool for patterning 60 nm hp in a larger exposure field on a wafer. And he finally installed this EUV exposure tool at NewSUBARU synchrotron facility at the BL03A beamline. In 2001, the world first 60-nm-hp-resist pattern is succeeded with the synchronized mask and wafer stages to achieved the large exposure field on a wafer. He is an expert of the EUV lithographic technology, including optics, exposure tool, mask and resist technologies. He is now collaboration many companies in world wide for EUV resist, EUV mask and so on which are related to the EUV lithography. Currently in NewSUBARU synchrotron facility which is the largest synchrotron facility operated by the university in Japan, we have totally nine beamlines in operation, and three beamlines are used mostly for EUV lithography. Each beamline has only one instrumentation for R&D of EUV resist, mask, optics and so on, which is opened for the users in world wide.