Metal Oxide Thin Film Preparation• Specialized in synthesis of reducible oxide thin films (WOx, NbOx, MOx, VOx) via Atomic Layer Deposition (ALD) on supported metal catalysts for hydrodeoxygenation.• Achieved monolayer coating of WOx and NbOx thin films on single crystals in UHV chambers by Physical Vapor Deposition (PVD).Development of High-performance Novel Composite Thin-film Nanocatalysts• Based on experimental facts, literature, and scientific principles, hypothesized and proved that addition of metal oxide thin films can improve the hydrodeoxygenation performance.• Developed an Atomic Layer Deposition (ALD) system to deposit metal oxide thin films on supported metals. Preciseness of ALD process was confirmed with STEM, TEM, EDS.• Significantly enhanced the catalytic activity (>threefold) and selectivity (>95%) to desired products in an atmospheric-pressure continuous flow reactor, compared to bare transition metals. Results were measured and calibrated by a GC-MS.• Discovered the interactions at transition metal/metal-oxide interface and reaction pathways by XPS, TPD and HREELS.