Process Engineer
CurrentCVD Ruthenium development for advanced interconnect + 2 yearsGraphene development + 8 months
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Yuji Otsuki is listed as Process Engineer at TEL Technology Center, America, based in Albany, New York, United States. AeroLeads shows a matched LinkedIn profile for Yuji Otsuki.
Yuji Otsuki previously worked as Process Engineer - Thin film deposition at Tokyo Electron Technology Solutions Limited and Research Fellow at Japan Society For The Promotion Of Science - Kyoto University. Yuji Otsuki holds Doctor Of Philosophy - Phd, Science from Kyoto University.
I am developing new film deposition processes and new materials analysis methods.I used state-of-the-art laser spectroscopy and surface science technique to analyze the structure of thin films, during doctoral studies.Patent list: https://rb.gy/babm56
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Albany, New York, United States
CVD Ruthenium development for advanced interconnect + 2 yearsGraphene development + 8 months
Japan
Gap fill deposition of dielectric material by ALD: +2 yearsDevelopment of material analysis method for trench samples: +2 years
Kyoto, Japan
Spectroscopic study of the structure of thin ice films deposited on metal- Surface-selective nonlinear spectroscopy using femtosecond pulsed laser: 6 years- Clean surface preparation and surface analysis using UHV equipment: 6 years
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Yuji Otsuki works for TEL Technology Center, America.
Yuji Otsuki is listed as Process Engineer at TEL Technology Center, America.
Yuji Otsuki is based in Albany, New York, United States while working with TEL Technology Center, America.
Yuji Otsuki has worked for Tel Technology Center, America, Tokyo Electron Technology Solutions Limited, and Japan Society For The Promotion Of Science - Kyoto University.
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Yuji Otsuki holds Doctor Of Philosophy - Phd, Science from Kyoto University.
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