Implant(2 year)-Axcelis->(GSD)-PATC->(PI9500)-AMAT->(Trident，HCP，VIISta)product suffered bin fail which caused yield loss 2.2%Furnace(1 year)-TEL ->(INDY PLSU)Process change for Gate spacer oxide process to avoid LDD implant diffusing to deeper depth,2% yield gained.
Frequently Asked Questions about 楊凱鈞
What company does 楊凱鈞 work for?
楊凱鈞 works for 晶豪科
What is 楊凱鈞's role at the current company?
楊凱鈞's current role is Product Engineer.
What schools did 楊凱鈞 attend?
楊凱鈞 attended 國立清華大學.
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