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At the Advanced Research Center for Nanolithography (ARCNL) we do exciting fundamental physics at the highest possible level with a relevance to key technologies in nanolithography. We wish to contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature. About ARCNL ARCNL started in January 2014 and opened its lab doors in October of the same year. ARCNL’s start was within one year after ASML had issued a tender for proposals for a research center that would feed the company with new, fundamental knowledge. ASML is the world leader in the production of the lithography machines that define the structures of processor and memory chips for computers, tablets and smartphones. In order to remain at the forefront it constantly innovates its products and processes. Novel insights from research by excellent academics in the relevant fields will enable them to continue making big leaps.

Company Details

Employees
87
Founded
-
Address
Science Park 106, Amsterdam,1098 Xg,netherlands
Industry
Research Services
NAICS
Scientific Research and Development Services
Research and Development in the Physical, Engineering, and Life Sciences
Research and Development in the Physical, Engineering, and Life Sciences (except Nanotechnology and Biotechnology)
Website
arcnl.nl
HQ
Amsterdam
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Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids - ACS Publications

Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids ACS Publications

A force controlled tribometer for pre-sliding measurements at the nanometer scale - Frontiers

A force controlled tribometer for pre-sliding measurements at the nanometer scale Frontiers

Marcelo Ackermann to head ARCNL - Bits&Chips

Marcelo Ackermann to head ARCNL Bits&Chips

Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography - ACS Publications

Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography ACS Publications

KIC grant awarded to improve imaging of semiconductor chips - TU Delft

KIC grant awarded to improve imaging of semiconductor chips TU Delft

Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography - ACS Publications

Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography ACS Publications

Hf Deposition Stabilizes the Surface Chemistry of Perovskite Manganite Oxide - ACS Publications

Hf Deposition Stabilizes the Surface Chemistry of Perovskite Manganite Oxide ACS Publications

NWO-I - koepel voor onderzoekers - nwo.nl

NWO-I - koepel voor onderzoekers nwo.nl

Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography - ACS Publications

Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography ACS Publications

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