The HelsinkiALD group, led by Professors Mikko Ritala and Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
Company Details
- Employees
- 1
- Founded
- -
- Address
- A. I. Virtasen Aukio 1, Helsinki,finland
- Industry
- Chemical Manufacturing
- NAICS
-
Chemical ManufacturingSoap, Cleaning Compound, and Toilet Preparation ManufacturingOther Chemical Product and Preparation ManufacturingPrinting Ink ManufacturingExplosives ManufacturingAll Other Chemical Product and Preparation ManufacturingCustom Compounding of Purchased ResinsPhotographic Film, Paper, Plate, and Chemical ManufacturingAll Other Miscellaneous Chemical Product and Preparation Manufacturing
- Keywords
- Atomic Layer Deposition, Thin Films, ALD.
- HQ
- Helsinki
Helsinkiald Questions
Helsinkiald's website is https://www.helsinki.fi/en/researchgroups/helsinkiald
Helsinkiald's LinkedIn profile is https://fi.linkedin.com/company/helsinkiald
Helsinkiald has
1 employees.
View email and phone details for 1
employees at Helsinkiald.
Helsinkiald's industry is
Chemical Manufacturing
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Helsinkiald's categories are Chemical Manufacturing
Helsinkiald's founding year is 1991
