XTREME Technologies GmbH

The aim of XTREME technologies is the development, manufacturing and marketing of high power EUV Sources and EUV Metrology for lithography and related applications in close cooperation with the parent company USHIO Inc., Tokyo, Japan. Our mission is to provide high-power EUV radiation sources at 13.5 nm wavelength and EUV metrology for next generation lithography and thus paving the way for the semiconductor manufacturing of the future. XTREME technologies investigate the most promising technical approaches of EUV sources: Gas Discharge Produced Plasma (GDPP) EUV Sources. Major research activities: • Development of Gas discharge produced plasma sources • Increase of conversion efficiency and output power • Long lifetime of source components • Debris mitigation and optics lifetime • Efficiency of EUV source collector optics systems and plasma shape tailoring • Thermal management and cooling of the discharge plasma unit • High performance pulsed power excitation circuits • Stability investigations and thermal issues using high power lasers coupled to Xenon-targets • Contamination of the beam path Contact: info@xtremetec.de