Senior Scientist
Worked principally on refining the hydrogen plasma environment to eliminate some of the drawbacks of plasma ion immersion implantation (PIII) such as etching of substrates due to plasma soaking in addition to implanting ions. Improved reliability of the plasma environment by extending times between chamber cleaning. Also involved in developing an inexpensive HV modulator (MOSFET & thyristor switch based) to help reduce the equipment costs.