Patrick, Ltd.A sole proprietorship started in 2003 to date.Provide support services to semiconductor manufacturing companies. Sites to wit:Spansion, LLC; Maxim Integrated Products; NXP, formerly Philips Semiconductors USA, Inc.The principal technology areas are in plasma systems and ion implantation. Support isprovided in three business aspects:· Direct on-tool engineering. Primary Tool Sets. Mattson Aspen II gas plasma (ICP)photoresist stripper. System modifications… Show more Patrick, Ltd.A sole proprietorship started in 2003 to date.Provide support services to semiconductor manufacturing companies. Sites to wit:Spansion, LLC; Maxim Integrated Products; NXP, formerly Philips Semiconductors USA, Inc.The principal technology areas are in plasma systems and ion implantation. Support isprovided in three business aspects:· Direct on-tool engineering. Primary Tool Sets. Mattson Aspen II gas plasma (ICP)photoresist stripper. System modifications and retrofits are key functions. MTTR/MTBFfrom a point of view of modification, retrofits, and intensive preventative maintenanceprograms. Mentoring of in-house technical staff has been integral in achieving thesegoals. Secondary service support that included Varian Ion Implant systems.· Sales representation for Radio Frequency power subsystems (used in gas plasmareactors) in association with Odyssey Technical Solutions. Work included earlyidentification of problems that carried through to complete customer satisfaction.· Support services, Ion Implant for the rebuilding of Ion Implant sources. Again MTBF thefocus to sustain key production processing tools.Budgeting, Accounting, all disciplines, critical to a business function. Show less

Mattson Technology September 1992 to Spring 1998· Provide engineering support for the Aspen I and Aspen II photoresist plasmastripping systems.· Provide customer support, which encompassed final test of each system priorto shipment, installation, process recipe development, baseline performanceevaluation and monitoring.· Identify and facilitate system modification requests between customers andthe systems engineering technical staff.· Site level coordinator for… Show more Mattson Technology September 1992 to Spring 1998· Provide engineering support for the Aspen I and Aspen II photoresist plasmastripping systems.· Provide customer support, which encompassed final test of each system priorto shipment, installation, process recipe development, baseline performanceevaluation and monitoring.· Identify and facilitate system modification requests between customers andthe systems engineering technical staff.· Site level coordinator for the first Texas based CVD, ASPEN II tool.Responsible for the interfacing system performance with the customer as wellas the development group in Fremont, Ca. Involved in throughputenhancement, particle control, hardware development, RF matchingenhancements, parts logistics, and process development. Provided onsitetraining for both process and equipment groups.· Installed and brought on line the first 300 mm tool (pre-alpha) with theInternational 300 Initiative group at Sematech in Austin,Lam Research CorporationProvided initial field service engineering in the Austin area for plasma dry etch systems used for oxide, nitride and polysilicon (CCL4 & CL2) processes. Established primary, continuous, field service support from the introduction in 1984 to a population of 30 systems. Show less