Frederick Pool Email & Phone Number

Eugene, OR, US

Eugene, Oregon

Hillsboro, Oregon

The charter for the Advanced Technologies Integration (ATI) group is to develop, integrate & certify robust technologies that enable winning products. ATI is responsible for ensuring robust manufacturable processes are development which integrate seamlessly into high volume production.

Hillsboro Oregon

• Manage the etch process engineers responsible for sustaining of 24/7 production environment. Includes process development, part failure analysis and qualification of production tools. Requires organization.
• Extensive use data analysis tools for design of experiment, statistical analysis of process changes (ANOVA calculations) and monitoring of tool interactions with device parametric performance.
• Use of Microsoft Word, Excel, Project and Powerpoint to manage and present process initiatives and developments. Some use and editing of Access databases.
• Attend and support interdisciplinary meetings with production operations, equipment support, failure analysis teams and senior management in decisions to resolve and optimize corporate priorities. Work with.

Hillsboro Oregon

Newbury Park CA

• Sustaining of plasma etch production processes using statistical process control (SPC) methods for fabrication of GaAs/AlGaAs heterojuction bipolar transistors (HBT). Primary responsibility is for GaAs/AlGaAs etching.
• Transferred processes to new production tools which achieved an increase in capacity from 350 wafer starts to 1400 wafer starts per week (accomplished in one year).
• Evaluation of production processes using statistical methods in DOE and effect of process changes on device parametrics (ANOVA calculations).
• Experience in sustaining of RIE PEVCD silicon nitride thin-film growth.
• Professional development courses: ANOVA and DOE statistical analysis using RS/1, MPCpS, FMEA (failure analysis), ANOVA and DOE statistical analysis using JMP.
• Two Rockwell Certificates of Appreciation (prior to Conexant “spin-off”)

Pasadena CA

• Developed processes for fabrication of GaAs/AlGaAs based Quantum Well Infrared Photodetectors (QWIPs) and associated binary optic microlenses in GaAs substrates using RIE plasma etching and electron cyclotron resonance.
• Developed a non-hermetic packaging concept based on a dual thin-film coating for low-weight, low-cost multichip modules. Growth and characterization of thin-films by FTIR, standard ellipsometry and through electrical.
• Development and characterization of high energy density (breakdown strength) silicon nitride films by ECR PECVD.
• Growth and characterization of a-Si:H and a-SiC:H for application in thin-film solar cells by RF glow discharge plasma and ECR microwave plasma CVD.
• Eight NASA Certificates of Recognition. Section 346 NOVA Award. Member of NASA Group Achievement Award for Mars Oxidation Experiment

Ph.D., Condensed Matter Physics

M.S., Physics

B.S., Mathematics

B.S., Physics