Junjie Wang, Ye, Ph.D. Email & Phone Number

Malta, Ny

- FEOL (Fin-STI-Gate-Junction-POC) characterization technical lead for 7nm FinFET advancedtechnology development, drive product yield ramp-up and performance boost projects throughclose collaboration among cross-functional teams.- Lead failure mode and root cause analysis including inline metrology, defect detection, electricaltest of health-of-line (HOL) and DOE structures, process tool/chamber variations, and functionalyield (SRAM memory, scan-chain/ATPG logic product) correlations.- Issue and communicate problem statements and high-level messages; build yield detractor grandPareto; present overall characterization work at high-level process module, characterization, andmanagement meetings.- Member of 7nm technology review committee for new process qualification and implementation.

Malta, Ny

- Analyzed electrical HOL and parametric test data from test-site chip to support Fin-STI-Gate-Junction-MOL modules, identified yield signals and root cause of failures to understand andisolate process/design/layout weakness, and provide guidance for optimization.- Built structural scorecard to track key device structures and drive module development activitiesto meet Process Assumption (PA) targets.- Identified shifts and split signals from critical inline metrology and defect parameters with fastturnaround of correlation analysis to identify the root cause.- Developed an automated data processing program with a user interface (UI) using R/SQLto streamline HOL reporting, which significantly improved working efficiency with team-wideimpact (acknowledged with GLOBALFOUNDRIES’ SPOTLIGHT award).

Hopewell Junction

Owner of electrical analysis on yield issues for 14nm Fin-Junction, and successfully qualified14nm SOI technology for IBM server division.

- Measured and analyzed electrical data from novel 2D materials (graphene, MoS2, WSe2, etc.) based transistor devices fabricated using cleanroom-based nano/micro-fabrication/processing including electron-beam/photo-lithography, dry/wet etching, and thin film deposition.- Designed and constructed a chemical vapor depositioin (CVD) system, synthesized high-quality large-area monolayer graphene film, and fabricated graphene transistors with high mobility.- Developed reactive ion etch (RIE) recipe to fluorinate CVD-grown monolayer graphene sheets using CF4 plasma, and examined its properties systematically via microscopic and spectroscopic probes.- Designed and fabricated graphene-based ion-sensitive field-effect sensors, and demonstrated their potential in on-chip, label-free and real-time biosensing applications.

Phd, Experimental Condensed Matter Physics, 3.75

Bachelor Of Science (B.S.), Physics