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Moshe Dolejsi is listed as Integration Engineer @ Intel Corporation formerly PhD in Directed Self Assembly @ UChicago at Intel Corporation, a company with 133841 employees, based in Portland, Oregon, United States. AeroLeads shows a work email signal at intel.com and a matched LinkedIn profile for Moshe Dolejsi.
Moshe Dolejsi previously worked as Integration Engineer at Intel Corporation and Yield Engineer - Defect Reduction at Intel Corporation. Moshe Dolejsi holds Doctor Of Philosophy - Phd, Molecular Engineering from University Of Chicago.
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AeroLeads found 1 current-domain work email signal for Moshe Dolejsi. Compare company email patterns before reaching out.
Currently Intel Integration Engineer (baking but chips and modules instead of cakes and ingredients)Previously I got my Ph.D. @ UChicago working on nanomanufacturing materials and processes for 28 nanometer and lower full pitch features. I have 4+ years of cleanroom process development experience (Litho, Dep, Etch), and am also experienced in metrology (AFM, SEM, XRay Scattering), and the necessary computer analysis to extract meaningful metrics (LER, LWR, EPR, etc) using python and/or matlab. The core of my research focuses on new methods and materials for Directed Self-Assembly (DSA), an alternative lithography approach that allows for large (EG 82 nm pitch) lithographically defined templates to be converted into much smaller (EG 28 nm pitch) features without any additional exposure or etch steps.Previously I received my undergraduate degree in Chemical Engineering from North Carolina State University where I studied siloxane systems within the Genzer group where I was actively researching polymer synthesis for 4 years.
Listed skills include Latex, Microsoft Excel, Vba, Maple, and 21 others.
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Hillsboro, OR
Connecting engineers with problem statements to engineers with solutions. Model based problem solving. Drawing rectangles in PowerPoint and finding schemes to make the silicon match.11 divisional awards, 8 filed patents
Hillsboro, Oregon, United States
Defects Bad. Yield Good. Worked on daily task force to make the former go down and the latter go up
Greater Chicago Area
When two molecules are dissimilar they will try to phase separate, which is especially true for larger molecules like polymers. By tethering two blocks of dissimilar polymer together this phase separation can only occur at the length scale of the molecule which we call a block copolymer. By presenting the right chemical and topographic cues on a wafer we.
Searle Clean Room
Responsible for managing and maintaining UHV Sputtering Systems, and RIEs during an interim period.
Raleigh-Durham, North Carolina Area
Creation of novel silicone polymers and networks. Identification of chemical precursors by collecting and analyzing GC-MS data. Gel analysis conducted via DMTA.
Raleigh-Durham, North Carolina Area
Performed UV reactions, utilized separatory techniques, and identified products with H NMR, C NMR.
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Aaron Tse
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Activities and Societies: AICHE, Tutoring, Golden Key International, Phi Kappa Phi
Quick answers generated from the profile data available on this page.
Moshe Dolejsi works for Intel Corporation.
Moshe Dolejsi is listed as Integration Engineer @ Intel Corporation formerly PhD in Directed Self Assembly @ UChicago at Intel Corporation.
AeroLeads has found 1 work email signal at @intel.com for Moshe Dolejsi at Intel Corporation.
Moshe Dolejsi is based in Portland, Oregon, United States while working with Intel Corporation.
Moshe Dolejsi has worked for Intel Corporation, The University Of Chicago, and North Carolina State University.
Moshe Dolejsi's colleagues at Intel Corporation include Sandip Gajera, Rebecca Garrett, Ahn Youngsoo, Bradly S Kaderly, and Ido Peled.
You can use AeroLeads to view verified contact signals for Moshe Dolejsi at Intel Corporation, including work email, phone, and LinkedIn data when available.
Moshe Dolejsi holds Doctor Of Philosophy - Phd, Molecular Engineering from University Of Chicago.
Moshe Dolejsi is listed with skills including Latex, Microsoft Excel, Vba, Maple, Mathematica, Schlenk Line, Gc Ms, and Hplc.
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