System engineer for a new laser system used in manufacturing.

Architect in the development of the next generation EUV lithography platform

System function architect for the next generation EUV machinesDelivered the roadmap for a key system function in the EUV product

Module architect for one of the modules on in ASML's EUV lithography machine

Lead engineer part of EUV Lithography design and development Delivered technical solution to scale EUV manufacturing leading to faster install and repair times at customers (example at TSMC)Training new colleaguesDesigned improvement to enable volume manufacturing of EUV machinesDelivered solutions to customer problem while taking root cause learnings back into (re)designKeywords: Problem solving, lead engineer, laser physics, python, Monte Carlo simulations.

Engineer in the Wafer metrology-sensing group (hardware) at ASML. Delivered several improved designs spanning all stages of the V-model for this diffraction-based metrology machine. This machine uses light to measure dimensions of the order of 10-100 atoms on a silicon wafer. Specified requirements or translated high level product requirement into hardware and software requirement. Worked closely with multiple stakeholders to convert these requirement into quality product.

Mentoring underprivileged children living the slums of Mumbai towards a better education.

Providing technical consultancy to the Dutch high tech industry and on-campus recruitment related activities.

Goal: To design a Silicon-on-Insulator (SoI) photonics crystal based Lab-on-a-Chip device with the ability to trap and sort disease causing bacteria in water.Achievements- Demonstrated the unique trapping properties of photonic crystal waveguides using FDTD simulations and hands on experiments. Clean room experience in SoI device fabrication. This work was the first of its kind in literature.

Experimental analysis of a gas ionization detector to detect nuclear particles. Work with Xenon gas led to a publication.

EXAFS analysis of HCP Zirconium and monoclinic Zirconium Oxide using feff8.4 and Ifeffit softwares.Recorded spectrum for Zr metal foil and ZrO2 on Swiss Light Source (SLS) synchrotron.