Eastman Kodak Company - Lead ink formulator responsible for the design and commercialization of pigment-based inks for consumer thermal ink jet systems. Ink designs include nano-particulate pigment dispersions supported by proprietary urethane-acrylic binder/jetting-aid technology to enable both image durability and efficient, reliable jetting performance in all commercialized Kodak consumer ink jet systems. Invented and developed various technologies for ink jet ink formulation to improve durability, reliability, storage stability, and jetting performance including nano-particulate stability additives, and polyether-, polyurea-, siloxane-, and fluoro- modified polyurethane binder technology (-5 patents awareded and 5 applications published) - Chief imaging scientist and imaging science team leader responsible for development and maintenance of image processing data path for the retail digital minilab systems accounting for thousands of worldwide retail sites. Responsibilities included system requirements specification and documentation as well as customer support, technology strategy, budget, and personnel. Received several awards for digital imaging excellence. (2 patents awarded) - Imaging materials scientist responsible for invention and development of silver halide based technologies including silver halide crystal designs commercialized in high-speed color negative film products including the highly profitable Kodak Ultra 400 and Gold Max 800 products as well as various silver halide technologies to improve image quality, environmental impact, and manufacturing robustness (15 patents awarded) - Microlithography process research and engineering, including vapor-phase and plasma resist processing (1 patent awarded)Texas Instruments - Semiconductor fabrication process engineer with experience in plasma processing, chemical vapor deposition and general MOS device fabrication methodsSpecialties: Pigment-based inks, polymer design, pigment dispersions, jetting performance, image quality, image science, color science, image durability, jetting reliability, ink stability, polyurethanes, acrylics, dispersing agents, pigment milling, rheology, surface science, nano-technology, silver salts, dopants, crystal morphology, light sensitization, MOS fabrication, photoresist processing, plasma etch, CVD, intellectual property, Matlab
